Sputter Coating, Physical Vapor Deposition, and Vacuum Deposition
VPE specializes in thin film coating for a diverse range of applications, including sensors, anti-multi-factoring, corrosion resistance, electronics, biomedical devices, satellites, and particle physics apparatus. Coating materials include gold, platinum, chromium, titanium, copper, aluminum, and nickel.
VPE Thin Film Coating Capabilities
Our experience with a variety of thin film coating methods ensures that we use the most appropriate technique for each application.
- Electron Beam: Very high deposition rates may be achieved with this type of thin film coating process.
- Ion Plating: In this technique, the substrate is electrically biased, which can increase coating adhesion to the substrate and allow us to tailor the physical and electrical characteristics of the coating deposit.
- Sputtering: This thin film coating method produces a precisely controllable stream of coating atoms that exhibit high adhesion to substrates.
- Reactive Sputtering: Ambient sputtering atmospheres may be controlled to yield reactively sputtered coatings, such as titanium nitride and aluminum oxide.


VPE – California
VPE – Massachusetts
World's Largest Vacuum Hot Press
60 Fitchburg Road
Ayer, Massachusetts 01432
Recent News
New Research Project – VPE & Sandia National Laboratories to Improve the Mechanical Life of Diffusion Bonded Heat ExchangersJanuary 29, 2018 - 4:41 pm
VPE and CEO Carl Schalansky Receive 2017 Award for Excellence in Technology Transfer by the Federal Laboratory Consortium (FLC)July 18, 2017 - 4:14 pm